光刻与纳米工程
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RAITH150-TWO
SEM(扫描电镜)与FIB(聚焦离子束)光刻配件
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Lithography & nanoengineering
RAITH50
RAITH50
RAITH50 是通用的电子束光刻工具,适用于微机电系统(MEMS)和光学干涉元件的研发。
可操作最大2平方英寸内的样品。
Key applications
Direct write on up to 2 inch samples with sub 100 nm resolution, ideal for MEMS applications
Optical elements like photonic crystals, beam splitters, gratings, DFB lasers or waveguides
Metrology, SEM inspection and sample navigation
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