光刻与纳米工程
ionLiNE
e_LiNE
RAITH150-TWO
SEM(扫描电镜)与FIB(聚焦离子束)光刻配件
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Lithography & nanoengineering
e_LiNE
e_LiNE
e_LiNE
是一款适用于高等院校和科研院所的超高分辨率电子束光刻系统及纳米工程平台。
可选的纳米显微操作、
EBID
(电子束诱导沉积)、
EBIE
(电子束诱导刻蚀)等功能可将e_LiNE扩展成多功能的纳米工程平台。世界领先的e_LiNE电子管系统极其适合在CNT(碳纳米管)的研究、薄膜工程、光子晶体和EBID等领域的重要应用。
Key applications
Lithography on 4 inch samples
EBID
and
EBIE
In-situ electrical measurements and nanomanipulation, e.g. CNT or nanorods
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e_LiNE brochure
Zero stitching error using Fixed Beam Moving Stage (FBMS) mode
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Raith Micrograph Award 2010 - final stage
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