RAITH150-TWO

...offers modern EBL system architecture AND its mini-environment renders infrastructure investments unnessecary .

...is the right choice for

Researchers and universities

• Easy to learn and to use for all skill levels
• Multi-user management supports concurrent access by multiple users with different privileges

Industrial and academic development groups

• Professional-grade design files
• Automated task lists
• Device, wafer or mask level operation

Centralized nano and service centers

• Multi-project wafer exposures
• Fastest operation speed
• Well-established support with professional support teams

...enables extensive applications

• Ultra High Resolution (UHR) exposures
• Mix-and-match with optical lithography
• Advanced device prototyping
• High resolution template writing
• Optical devices with zero error