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e_LiNE

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Basic hardware features
  • Thermal assisted field emission gun
  • Cross-over free column with highest beam current density at 2 nm spot size
  • Laser interferometer stage with 100 mm by 100 mm travel range and 2 nm resolution achieved by closed-loop piezo-positioning
  • 10 MHZ -controlled digital pattern generator
  • Optional gas injection system, , EDX, optical microscope, loadlock, , mode exposure
e_LiNE specifications
  • Minimum line width < 20 nm
  • accuracy 40 nm
  • accuracy 40 nm
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