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e_LiNE

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e_LiNE is a ultra high resolution electron beam lithography system and nanoengineering workstation for universities and other academic institutions.

Selected options for nanomanipulation, and expand this system to a versatile nano-engineering workstation. The state-of-the-art e_LiNE electron column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID.
Key applications
  • Lithography on 4 inch samples
  • and
  • In-situ electrical measurements and nanomanipulation, e.g. CNT or nanorods
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e_LiNE brochure PDF
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Zero stitching error using Fixed Beam Moving Stage (FBMS) mode PDF
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References
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Gallery
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Download Adobe Acrobat Reader
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Electron beam lithography system_e_LiNE_pic1.jpg
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e_LiNE - Ultra high resolution electron beam lithography and nanoengineering workstation
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Electron beam lithography applications_e_LiNE_pic2.gif
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Manipulation of nano structures
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© 2010 by Raith GmbH