| Benefit | Feature |
|---|
| Automated ion beam fabrication capabilities | Designed in nanolithography tool architecture |
| Superior beam current and beam position stability | Patented NanoFIB column concept non tilted laser interferometer stage |
| High lateral selectivity of ion beam | Specialised ion optics design |
| Low dose application regime | High speed 16 bit pattern generator with nanosecond ion dose control |
| Patterning and blind navigation on large areas | Closed loop laser interferometer stage control and top view optical microscope |
| Guaranteed nanofabrication performance | Integrated ion optics, patterning, nanofabrication and engineering software suite |
| Ease and reliability of operation | Multi user management and one integrated software platform |
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