ionLiNE is a novel ion beam lithography, nanofabrication and engineering workstation for low dose applications in surface science, thin film engineering and applied physics research.Designed in an uncompromised nanolithography system architecture, ionLiNE represents a new instrument class for research and development. ionLiNE as dedicated ion beam nanolithography, fabrication, and engineering instrument offers unique opportunities for exciting research results. The patented NanoFIB TM ion optics provides overnight beam current stability required for advanced and automated patterning. Low beam tails offer high selectivity. For applications covering large areas, a laser interferometer controlled stage is integrated. Key applications - Low dose ion events
- Thin film engineering
- Surface functionalisation
- Localised defect injection
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