光刻与纳米工程
SEM(扫描电镜)与FIB(聚焦离子束)光刻配件
ELPHY
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ELPHY
Quantum
激光工作台(Laser stage)
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SEM & FIB lithography kits
ELPHY Quantum
ELPHY Quantum
ELPHY
Quantum
是最广泛的使用于SEM&FIB的通用光刻系统附件。
从图形设计、曝光参数管理、图形覆盖(
overlay
)对准到步进重复曝光等全部所需功能都整合到一个软件包中。
ELPHY
Quantum
是一款特别设计的16位，扫描频率2.5 MHz的矢量扫描电子束偏转数模转换器。可以安装在使用最新的Windows操作系统的微机上。Raith提供全球范围的基础安装支持及培训，确保您在最短时间内使用上Raith的设备。
ELPHY
software features
Hierarchical fully integrated
GDSII
layout editor/viewer
Data import for
DXF
,
CIF
and ASCII data
Exposure parameter adjustment and calculation
Macro generation and VB scripting
Digital image acquisition
Line width measurement capabilities
SEM/FIB remote control and FIB module
A second offline licence is included
Optional: Fully integrated
proximity effect
correction and parameter calculation
1/2
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ELPHY brochure
Installation requirements and useful options for SEM lithography
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Gallery
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