Lithography & nanoengineering
SEM & FIB lithography kits
ELPHY
Plus
ELPHY
Quantum
Laser stage
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SEM & FIB lithography kits
ELPHY Plus
ELPHY Plus
ELPHY
software features
Hierarchical fully integrated
GDSII
layout editor/viewer
Data import for
DXF
,
CIF
and ASCII data
Exposure parameter adjustment and calculation
Macro generation and VB scripting
Digital image acquisition
Line width measurement capabilities
SEM/FIB remote control and FIB module
A second offline licence is included
Optional: Fully integrated
proximity effect
correction and parameter calculation
ELPHY
Plus
hardware features
6 MHz high-speed pattern generation hardware (19 inch
DSP
Unit decoupled from PC)
Fast, noise-reduced, deglitched and high performance 16 bit DAC vector scan beam deflection
16 bit DAC vector scan beam deflection
2 ns writing speed resolution
TTL and 100 V blanking signal drivers
12 bit AD channel for reading detector signal (image acquisition)
TTL signal for FIB/SEM external beam control request
3 additional DAC per channel for alignment and calibration (hardware for scaling, rotation / orthogonality and shift)
Decoupling from PC electronics and thermo control for main and calibration DACs
previous page
2/2
ELPHY brochure
Installation requirements and useful options for SEM lithography
References
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Raith Micrograph Award 2010 - final stage
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Australia
Canada
China
France
Great Britain
India
Israel
Italy
Japan
Korea
Malaysia
Russia / C.I.S.
Singapore
Taiwan
Thailand
Turkey
USA
Vietnam
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